Effect of Microwave Treatment in a High Pressure Microwave Reactor on Graphene Oxide Reduction Process—TEM, XRD, Raman, IR and Surface Electron Spectroscopic Studies

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dc.contributor.authorLesiak, Beata
dc.contributor.authorTrykowski, Grzegorz
dc.contributor.authorTóth, József
dc.contributor.authorBiniak, Stanisław
dc.contributor.authorKövér, László
dc.contributor.authorRangam, Neha
dc.contributor.authorMalolepszy, Atur
dc.contributor.authorStobinski, Leszek
dc.contributor.organizationInstitute of Physical Chemistry, Polish Academy of Sciences, Warsaw, Polanden
dc.contributor.organizationFaculty of Chemistry, Nicolaus Copernicus University in Toruń, Polanden
dc.contributor.organizationInstitute for Nuclear Research, Debrecen, Hungaryen
dc.contributor.organizationFaculty of Chemical and Process Engineering, Warsaw University of Technology, Polanden
dc.date.accessioned2022-03-29T14:30:13Z
dc.date.available2022-03-29T14:30:13Z
dc.date.issued2021-09-30
dc.description.abstractReduced graphene oxide (rGO) was prepared by chemical reduction of graphene oxide (GO) (a modified Hummers method) in aqueous solutions of hydrazine (N2H4), formaldehyde (CH2O), formic acid (HCO2H) accompanied by a microwave treatment at 250 °C (MWT) by a high pressure microwave reactor (HPMWR) at 55 bar. The substrates and received products were investigated by TEM, XRD, Raman and IR spectroscopies, XPS, XAES and REELS. MWT assisted reduction using different agents resulted in rGOs of a large number of vacancy defects, smaller than at GO surface C sp3 defects, oxygen groups and interstitial water, interlayer distance and diameter of stacking nanostructures (flakes). Average number of flake layers obtained from XRD and REELS was consistent, being the smallest for CH2O and then increasing for HCO2H and N2H4. Number of layers in rGOs increases with decreasing content of vacancy, C sp3 defects, oxygen groups, water and flake diameter. MWT conditions facilitate formation of vacancies and additional hydroxyl, carbonyl and carboxyl groups at these vacancies, provide no remarkable modification of flake diameter, what results in more competitive penetration of reducing agent between the interstitial sites than via vacancies. MWT reduction of GO using weak reducing agent (CH2O) provided rGO of 8 layers thickness.en
dc.identifier.citationLesiak, B.; Trykowski, G.; Tóth, J.; Biniak, S.; Kövér, L.; Rangam, N.; Małolepszy, A.; Stobi ́nski, L. Effect of Microwave Treatment in a High Pressure Microwave Reactor on Graphene Oxide Reduction Process—TEM, XRD, Raman, IR and Surface Electron Spectroscopic Studies. Materials 2021, 14, 5728. https://doi.org/10.3390/ma14195728en
dc.identifier.doi10.3390/ma14195728
dc.identifier.urihttps://open.icm.edu.pl/handle/123456789/21209
dc.language.isoen
dc.publisherMDPIen
dc.rightsUznanie autorstwa 4.0 Międzynarodowe*
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/*
dc.subjectgraphene oxide (GO)en
dc.subjectreduced graphene oxide (rGO)en
dc.subjectstructuralen
dc.subjectchemical propertiesen
dc.titleEffect of Microwave Treatment in a High Pressure Microwave Reactor on Graphene Oxide Reduction Process—TEM, XRD, Raman, IR and Surface Electron Spectroscopic Studiesen
dc.typearticleen
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